发明名称 EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <p>By adjusting optical characteristics of an optical system (PLL) by irradiation of a movable optical element (90) with a non-exposure light by an irradiation device (91) and adjusting optical characteristics of the optical system (PLL) by moving the optical element (90) by the optical characteristic adjustment device, it is possible to correct, for example, fluctuation of the optical characteristics of the optical system attributed to the temperature distribution of the optical element around the position eccentric from the optical axis. Moreover, under the dipole illumination condition, in order to facilitate correction by the optical characteristic adjustment device, the optical characteristic of the optical system attributed to temperature distribution of non-rotational symmetry of the optical element in the vicinity of pupils (PP1, PP2, PP3), the irradiation device (91A) irradiates a non-exposure light tot he optical element (111) so that the optical element (111) has a temperature distribution of rotational symmetry. Thus, it is possible to effectively correct the fluctuation of the optical characteristics of the optical system attributed to the illumination light absorption. ® KIPO & WIPO 2008</p>
申请公布号 KR20080020599(A) 申请公布日期 2008.03.05
申请号 KR20077025563 申请日期 2007.11.02
申请人 NIKON CORPORATION 发明人 UEHARA YUSAKU;UCHIKAWA KIYOSHI;ISHIYAMA SATOSHI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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