POSITION SETTING METHOD FOR WAFER ALIGNMENT

摘要

A position setting method for wafer alignment is provided to prevent a search error by applying reference data using a search mark position of a first wafer as a center of a search sensor. A first wafer is loaded on a wafer stage(S101). A control unit recognizes a search mark to align the wafer(S103). A first exposure process is performed(S105). A first feedback process is performed by the control unit before a second wafer is loaded(S107). The second wafer is loaded on a position using the search mark of the first wafer as a center of the sensor(S109). A second wafer search process is performed(S111). A second exposure process is performed(S113). A second feedback process is performed by the control unit before a third wafer is loaded(S115). The third wafer is loaded on a position using the search mark of the second wafer as a center of the sensor(S117).