发明名称 |
STAMPER FOR FORMING FINE PATTERN AND METHOD FOR MANUFACTURING THEREOF |
摘要 |
<p>A stamper for forming a fine pattern and a method for manufacturing the same are provided to easily modify an ITO(Indium-Tin Oxide) layer to minimize defect rate by manufacturing the stamper through a wet etching of the ITO layer on a transparent layer. An ITO layer(12) being a transparent material and a photoresist(14) are sequentially laminated on a transparent substrate(11). The photoresist is selectively exposed and developed to form a space unit(15) for exposing the ITO layer to the outside. The exposed ITO layer is etched to expose the transparent substrate to the outside. The photoresist remaining on the ITO layer is removed. A wet etching process is performed using an etching liquid whose main component is hydrochloric acid, thereby etching the ITO layer.</p> |
申请公布号 |
KR20080020058(A) |
申请公布日期 |
2008.03.05 |
申请号 |
KR20060082852 |
申请日期 |
2006.08.30 |
申请人 |
LG MICRON LTD. |
发明人 |
KIM, DO SIK;KANG, KAP SEOK;PARK, JAE WOO;BACK, SEUNG HO;KANG, SEUNG HAN |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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