发明名称 Method of aberration correction and electron beam system
摘要 <p>There is disclosed an electron beam system in which the third-order aberration S 3 with two-fold symmetry is corrected. If a C s corrector (17) is operated, parasitic aberration S 3 (third-order aberration S 3 with two-fold symmetry) is produced. A corrective third-order aberration S 3 ' with two-fold symmetry that cancels out the parasitic aberration S 3 is produced within a multipole element (3,7) to correct the parasitic aberration S 3 . The electron beam (EB) is tilted relative to the optical axis (O) within the multipole element (3 or 7). The corrective third-order aberration S 3 ' with two-fold symmetry is introduced in each electron forming the tilted electron beam.</p>
申请公布号 EP1895564(A2) 申请公布日期 2008.03.05
申请号 EP20070253423 申请日期 2007.08.30
申请人 JEOL LTD. 发明人 HOSOKAWA, FUMIO
分类号 H01J37/153;H01J37/147 主分类号 H01J37/153
代理机构 代理人
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