发明名称 |
Guard ring for semiconductor devices |
摘要 |
<p>A guard ring (122) is formed in a semiconductor region that is part of a Schottky junction or Schottky diode. The guard ring is formed by ion implantation into the semiconductor contact layer without completely annealing the semiconductor contact layer to form a high resistance region. The guard ring may be located at the edge of the layer or, alternatively, at a distance away from the edge of the layer. A Schottky metal contact (110) is formed atop the layer, and the edges of the Schottky contact are disposed atop the guard ring.
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申请公布号 |
EP1633004(A3) |
申请公布日期 |
2008.03.05 |
申请号 |
EP20050018177 |
申请日期 |
2005.08.22 |
申请人 |
VELOX SEMICONDUCTOR CORPORATION |
发明人 |
CERUZZI, ALEX D.;POPHRISTIC, MILAN;SHELTON, BRYAN S.;LIU, LINLIN;MURPHY, MICHAEL;ZHU, TING GANG |
分类号 |
H01L29/872;H01L21/329;H01L21/44;H01L29/06;H01L29/20 |
主分类号 |
H01L29/872 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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