发明名称 Guard ring for semiconductor devices
摘要 <p>A guard ring (122) is formed in a semiconductor region that is part of a Schottky junction or Schottky diode. The guard ring is formed by ion implantation into the semiconductor contact layer without completely annealing the semiconductor contact layer to form a high resistance region. The guard ring may be located at the edge of the layer or, alternatively, at a distance away from the edge of the layer. A Schottky metal contact (110) is formed atop the layer, and the edges of the Schottky contact are disposed atop the guard ring. </p>
申请公布号 EP1633004(A3) 申请公布日期 2008.03.05
申请号 EP20050018177 申请日期 2005.08.22
申请人 VELOX SEMICONDUCTOR CORPORATION 发明人 CERUZZI, ALEX D.;POPHRISTIC, MILAN;SHELTON, BRYAN S.;LIU, LINLIN;MURPHY, MICHAEL;ZHU, TING GANG
分类号 H01L29/872;H01L21/329;H01L21/44;H01L29/06;H01L29/20 主分类号 H01L29/872
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