LARGE SIZE TRANSMITTANCE MODULATION(TM) BLANKMASK AND MANUFACTURING METHOD OF LARGE SIZE TRANSMITTANCE MODULATION(TM) PHOTOMASK

摘要

A large sized transmittance modulation blank mask and a method for manufacturing a large sized transmittance modulation photo mask using the same are provided to effectively protect a transparent substrate during a dry etching process by forming an etch stop layer between the transparent substrate and a transmittance control layer. A photoresist pattern(12) is formed by exposing and developing a transmission unit region in order to form a transmission unit and a shielding unit pattern. An anti-reflective layer(10) and a shielding layer(8) are etched by using the photoresist pattern as an etching mask. A transmittance control layer(6) is etched with a dry etching process. The remaining photoresist is removed. A photoresist is formed on the entire surface of the resultant structure on which the pattern is formed. A semi-transmission region is exposed and developed to form a semi-transmission layer. The semi-transmission layer is formed by etching the anti-reflective layer and the shielding layer using the photoresist pattern as an etching mask. The remaining photoresist layer is removed.