Carbon containing sputter target alloy compositions

摘要

The invention provides a sputter target material. The sputter target material comprises an alloy system comprising homogeneous, densified Cr-Ti-C, wherein Ti comprises at least 0.5 and as much as 20 atomic percent, and C comprises at least 0.5 and as much as 20 atomic percent. A magnetic recording medium comprising a substrate and at least an underlayer comprising the sputter target material of the invention also is provided. A method of manufacturing a sputter target material further provided. The method can employ powder materials comprising a combination of elements can include a chromium alloy, a carbide or carbon containing master alloy.