发明名称 THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE
摘要 A TFT substrate and a manufacturing method thereof are provided to increase the capacitance of a storage capacitor by reducing the thickness of an insulating film of an upper part of a storage electrode pattern and improve an open ratio by reducing the size of the storage electrode pattern. A method for manufacturing a TFT(Thin Film Transistor) substrate comprises the following steps of: forming an active pattern(1200) and a storage electrode pattern(1300) on a substrate(1100); forming a gate insulating film(1400) where a thickness of a storage electrode pattern upper side is thinner than a thickness of an active pattern upper side; and injecting impurity ion into the storage electrode pattern.
申请公布号 KR20080020308(A) 申请公布日期 2008.03.05
申请号 KR20060083645 申请日期 2006.08.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 OH, HYUN UK
分类号 G02F1/136 主分类号 G02F1/136
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