发明名称 |
THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE |
摘要 |
A TFT substrate and a manufacturing method thereof are provided to increase the capacitance of a storage capacitor by reducing the thickness of an insulating film of an upper part of a storage electrode pattern and improve an open ratio by reducing the size of the storage electrode pattern. A method for manufacturing a TFT(Thin Film Transistor) substrate comprises the following steps of: forming an active pattern(1200) and a storage electrode pattern(1300) on a substrate(1100); forming a gate insulating film(1400) where a thickness of a storage electrode pattern upper side is thinner than a thickness of an active pattern upper side; and injecting impurity ion into the storage electrode pattern. |
申请公布号 |
KR20080020308(A) |
申请公布日期 |
2008.03.05 |
申请号 |
KR20060083645 |
申请日期 |
2006.08.31 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
OH, HYUN UK |
分类号 |
G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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