| 摘要 |
A mask and a method for manufacturing the same are provided to form a dummy bar pattern and to prevent peeling phenomenon by fabricating a dummy pattern on a dummy region that is a boundary between regions having different mask types. A mask includes a quartz substrate(1) and a dummy pattern. The quartz substrate has a first region(10) of a first mask type, a second region(20) formed with a second mask type different from the first mask type, and a third region(30) defined between the first region and the second region. The dummy pattern is formed on the third region and corresponds to a dummy bar pattern to be formed on a wafer. The dummy pattern includes a recess section and a protrusion section. The recess section is formed by recessing a part of the quartz substrate. The protrusion section is defined on an upper surface of the quartz which is not recessed. The dummy pattern is a line and space pattern, or a dot pattern. |
