| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method for a compound-semiconductor thin-film containing a group IB element, In and Ga as group IIIB elements and a group VIB element and having the excellent uniformity of Ga distribution in the film-thickness direction. SOLUTION: A precursor thin film 20 in which a first layer 21 containing In, a second layer 22 containing Cu and Ga and a third layer 23 containing Cu are laminated successively is formed on a substrate 10 by using a sputtering method, and a Cu (In, Ga) Se2 thin film is formed by thermally treating the precursor thin film 20 in an atmosphere comprising Se.</p> |
