发明名称 Method of generating a geometrical rule for germanium integration within CMOS
摘要 In a computer-assisted product development system comprising a processor and a storage, a software-implemented method for asserting design rules related to the manufacturability of optoelectronic devices comprising germanium. Design rules may be established for devices comprising germanium and/or germanium and silicon heterostructures, thereby enabling and/or enhancing the manufacturability of photodetectors comprising germanium in integrated CMOS devices according to standard and/or custom CMOS processes. In some cases, design rules may be established to define allowable ranges for geometrical parameters related to the shapes defined in one or more mask layers; in some cases, design rules may be established to define allowable ranges for geometrical parameters related to the dimensions of actually constructed devices. In some cases, design rules may be established based on processing constraints or yield or manufacturability considerations; in some cases, design rules may be used to help avoid physical configurations which may lead to inefficient or broken devices.
申请公布号 US7340709(B1) 申请公布日期 2008.03.04
申请号 US20050177133 申请日期 2005.07.07
申请人 LUXTERA, INC. 发明人 MASINI GIANLORENZO;GUNN, III LAWRENCE C.;CAPELLINI GIOVANNI
分类号 G06F17/50;G06F9/45 主分类号 G06F17/50
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