| 摘要 |
<p>An exposing apparatus is provided to improve alignment accuracy between a reticle and a substrate without degradation of throughput by employing plural photoelectric transducers for simultaneously detecting first marks or second marks. A projection optical system(3) is configured to project a pattern image of a reticle onto a substrate. A reticle stage is configured to maintain and drive the reticle. A position detecting unit(4) includes plural photoelectric transducers configured to detect a relative position relationship between a position detection mark formed on the reticle or the reticle stage, and a reference mark formed on the substrate stage. The position detection mark forms a plurality of mark groups arranged in a first direction. Each of the mark group includes a first mark for measuring a first direction position and a second mark for measuring a second direction position perpendicular with the first direction. The photoelectric transducers simultaneously detect the first marks or the second marks.</p> |
