发明名称 ELECTRODE PATTERNING LAYER COMPRISING POLYAMIC ACID OR POLYIMIDE AND ELECTRONIC DEVICE USING THE SAME
摘要 <p>Disclosed is an electrode patterning layer for use in the formation of an electrode pattern of any desired shape depending on the difference in wetting property of an electrode-forming solution used, which uses a highly reliable polyimide resin as an electronic material. An electrode patterning layer for use in the formation of an electrode pattern of any desired shape depending on the difference in wetting property of an electrode-forming solution used, electrode patterning layer being formed by irradiating a layer comprising a polyamic acid having the repeated unit represented by the general formula (1) or polyimide produced by dehydration and cyclization of the polyamic acid with ultraviolet lay to form a pattern: (1) wherein A represents a tetravalent organic group and B represents a divalent organic group in which one or more A's and B's may be used, and n is a positive integer, provided that at least one of A's is a tetravalent organic group having a alicyclic structure. ® KIPO & WIPO 2008</p>
申请公布号 KR20080019629(A) 申请公布日期 2008.03.04
申请号 KR20077029502 申请日期 2006.06.19
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 MAEDA SHINICHI;ONO GO
分类号 H01L21/28;C08G73/10;H01L29/786 主分类号 H01L21/28
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