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发明名称
发光元件之制造方法
摘要
本发明之目的在于提供一种可抑制因雷射光照射所产生之变质层所引起的发光量降低的发光元件之制造方法。本发明系一种发光元件之制造方法,包含有:照射雷射光步骤,系将雷射光照射于用以分离形成于基板上之发光元件的分离区域者;分离基板步骤,系将前述基板依前述分离区域物理性地分离者;及除去表面层步骤,系除去因前述分离基板步骤而露出之前述基板至少1个侧面的表面层者。
申请公布号
TW200812123
申请公布日期
2008.03.01
申请号
TW096125222
申请日期
2007.07.11
申请人
优迪那半导体有限公司
发明人
古谷章
分类号
H01L33/00(2006.01)
主分类号
H01L33/00(2006.01)
代理机构
代理人
恽轶群;陈文郎
主权项
地址
日本
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