发明名称 FILM DEPOSITION SYSTEM
摘要 <p>FILM DEPOSITIOM SYSTEM This invention includes a processing vessel capable of being evacuated to make a vacuum therein and a stage placed in the processing vessel capable of supporting an object to be processed thereon. A guide ring is placed on or above the stage so as to surround the outer circumference of the object to be processed mounted on the stage, is adapted to guide the object to be processed onto the stage when mounting the object to be processed onto the stage. A particle generation preventing space is formed between an inner peripheral part of the lower surface of the guide ring and the upper surface of the stage. (Fig. l)</p>
申请公布号 SG139537(A1) 申请公布日期 2008.02.29
申请号 SG20040021853 申请日期 2000.12.22
申请人 TOKYO ELECTRON LIMITED 发明人 ASAKURA KENTARO;TAKAYA, SHIMIZU
分类号 H01L21/31;C23C16/34;C23C16/44;C23C16/458;(IPC1-7):C23C16/458;H01L21/205 主分类号 H01L21/31
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