| 摘要 |
<p>A device for measuring thickness and/or rate of thickness increase of a film comprises at least one piezoelectric element, and first and second electrodes. A method of measuring thickness and/or rate of thickness increase of a film comprises applying a voltage across a piezoelectric element from a first electrode to a second electrode, thereby causing the piezoelectric element to vibrate, and measuring the rate of vibration of the piezoelectric element. Heat and/or cooling may be applied to the piezoelectric element. The piezoelectric element may be formed of quartz crystal, e.g., doubly rotated cut quartz crystal having a value for in the range of from about (33) degrees to about (36) degrees and a value for in the range of from about (18) degrees to about (20) degrees. Alternatively or additionally, the piezoelectric element may comprise a crystal having at least a first curved surface.</p> |
