发明名称 |
Method for cleaning photo mask |
摘要 |
<p>The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the production cost. The method for cleaning a photo mask with a pellicle mounted, in which the pellicle frame has a gas introducing hole and a gas discharging hole, comprises: a step of introducing a gaseous substituting substance from the gas introducing hole in a pellicle inner space surrounded by the photo mask and the pellicle, substituting foreign substances on the photo mask, and discharging the foreign substances from the gas discharging hole; and a step of irradiating an ultraviolet ray to the photo mask, while an air or a nitrogen gas or a rare gas is introduced from the gas introducing hole, for degrading the substituted substituting substance so as to be gaseous, and discharging the same from the gas discharging hole.</p> |
申请公布号 |
EP1892570(A2) |
申请公布日期 |
2008.02.27 |
申请号 |
EP20070016113 |
申请日期 |
2007.08.16 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
SHIMADA, SHU;TAKAHASHI, NORIYUKI;TANAKA, HIROKO;ISHII, HIROYUKI;SHOJI, YUSUKE;OHTSUKI, MASASHI |
分类号 |
B08B7/00;G03F1/64;G03F1/82 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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