发明名称 Printed non-volatile memory and manufacturing method thereof
摘要 <p>A nonvolatile memory cell is disclosed, having first (2) and second (3) semiconductor islands at the same horizontal level and spaced a predetermined distance apart, the first semiconductor island (2) providing a control gate and the second semiconductor island (3) providing source and drain terminals; a gate dielectric layer (4) on at least part of the first semiconductor island (2); a tunneling dielectric layer (5) on at least part of the second semiconductor island (3); a floating gate (7) on at least part of the gate dielectric layer (4) and the tunneling dielectric layer (5); and a metal layer in electrical contact with the control gate and the source and drain terminals. In one advantageous embodiment, the nonvolatile memory cell may be manufactured using an "all-printed" process technology.</p>
申请公布号 EP1892753(A2) 申请公布日期 2008.02.27
申请号 EP20070016503 申请日期 2007.08.22
申请人 KOVIO, INC. 发明人 KAMATH, ARVIND;SMITH, PATRICK;CLEEVES, JAMES MONTAGUE
分类号 H01L21/336;H01L21/208;H01L21/288;H01L29/788 主分类号 H01L21/336
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