Lithographic apparatus and device manufacturing method,申请号EP20020256193-传众专利搜索

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发明名称	Lithographic apparatus and device manufacturing method
摘要
申请公布号	EP1291721(B1)	申请公布日期	2008.02.27
申请号	EP20020256193	申请日期	2002.09.06
申请人	ASML NETHERLANDS B.V.	发明人	LEENDERS, MARTINUS HENDRIKUS ANTONIUS;MOORS, JOHANNES HUBERTUS JOSEPHINA;LOOPSTRA, ERIK ROELOF;GILISSEN, NOUD JAN;EURLINGS, MARKUS F. A.
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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