A wafer scale method of manufacturing optical waveguide devices and the waveguide devices made thereby
摘要
<p>The invention relates to a wafer scale process for the manufacture of optical waveguide devices, and particularly for the manufacture of ridge waveguide devices, and the improved waveguides made thereby. The present invention has found a process for achieving sub-micron control of an optical waveguiding layer thickness by providing a dimensionally stable wafer assembly into which adhesive (26) can be introduced without altering the planar relationship between a carrier wafer (12) and an optically transmissive wafer (14) in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices including thin optically transmissive layers. A pattern of spacer pedestals (20) is created by a deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer to a thin optically transmissive wafer. The tolerance achievable in accordance with this process provides consistent yield across the wafer.</p>
申请公布号
EP1873583(A3)
申请公布日期
2008.02.27
申请号
EP20070252595
申请日期
2007.06.26
申请人
JDS UNIPHASE CORPORATION
发明人
CATCHING, BENJAMIN F.;FRIEDRICH, DONALD M.;HULSE, CHARLES A.;VON GUNTEN, MARC K.;REED, JASON;KISSA, KARL;DRAKE, GLEN;DUNCAN, JULIA;SHA, HIREN V.;ZIEBA, JERRY;JIAZHAN XU, JASON;MINFORD, WILLIAM J.