AN ION IMPLANTATION DEVICE AND A METHOD OF SEMICONDUCTOR MANUFACTURING BY THE IMPLANTATION OF BORON HYDRIDE CLUSTER IONS,申请号EP20030762087-传众专利搜索

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发明名称	AN ION IMPLANTATION DEVICE AND A METHOD OF SEMICONDUCTOR MANUFACTURING BY THE IMPLANTATION OF BORON HYDRIDE CLUSTER IONS
摘要
申请公布号	EP1579481(A4)	申请公布日期	2008.02.27
申请号	EP20030762087	申请日期	2003.06.26
申请人		发明人
分类号	H01J37/08;H01J27/20;H01J37/317;H01L21/00;H01L21/265;H01L21/336;H01L21/8238	主分类号	H01J37/08
代理机构		代理人
主权项
地址

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