| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lactone copolymer resin which is highly transparent to radiation, can solve the problem on how to take a trade-off between resolution and exposure latitude and is suitable as a resin component in a chemical amplification resist to provide the resist with excellent dry etching resistance and pattern figure; and a radiation-sensitive resin composition containing the lactone copolymer resin. <P>SOLUTION: The lactone copolymer resin comprises a repeating unit represented by formula (1) and at least one selected from a repeating unit represented by formula (2-1) and a repeating unit represented by formula (2-2), wherein the resin can get alkaline-soluble by the action of an acid. The radiation-sensitive resin composition contains the lactone copolymer resin and a radiation-sensitive acid-generator. <P>COPYRIGHT: (C)2003,JPO |
