首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
METHOD FOR IMPROVING SURFACE ROUGHNESS OF PROCESSED FILM OF SUBSTRATE AND APPARATUS FOR PROCESSING SUBSTRATE
摘要
申请公布号
EP1632992(A4)
申请公布日期
2008.02.27
申请号
EP20040745451
申请日期
2004.05.31
申请人
TOKYO ELECTRON LIMITED
发明人
INATOMI, YUICHIRO
分类号
H01L21/027;G03F7/40;H01L21/00
主分类号
H01L21/027
代理机构
代理人
主权项
地址
您可能感兴趣的专利
SEWING PRODUCTION SYSTEM
DOUBLE JERSEY
SOLUTION FOR CHEMICAL ETCHING OF ALLOYS ON THE BASE OF ALUMINIUM
METHOD OF PRODUCTION OF LARGE-SIZED INGOT
METHOD OF CONTROLLING TENDENCY OF DISPERSION-HARDENING, CORROSION- IMMUNE STEEL TO INTERCRYSTALLINE CORROSION
PROTECTIVE BARRIER
ELECTROLYTE FOR PRODUCTION OF CHROMIUM COATINGS
CAST IRON
METHOD OF DETECTION OF DAMAGE TO COOLING SYSTEM OF METALLURGICAL FURNACE
BLAST FURNACE BURDEN FEEDING TROUGH
METHOD OF REFINING GASOLINE DISTILLATES
DRILLING FLUID
ADDITIVE TO DRILLING FLUIDS
WATER DILUTED PAINT AND VARNISH COMPOSITION
METHOD OF PREPARATION OF CIS-1,4,POLYBUTADIENE
METHOD OF PREPARING CHITOSAN
METHOD OF PREPARING N-ACETYLPHENYLALANINE
METHOD OF WALL BUILDING CERAMICS PRODUCING
METHOD OF PURIFYING UNDERGROUND WATER
METHOD OF PRODUCING COMPOSITION MATERIALS, TRANSIENT METAL-ALUMINIUM OXIDE