发明名称 Integrated circuit device, and method of fabricating same
摘要 There are many inventions described and illustrated herein. In a first aspect, the present invention is directed to integrated circuit device including SOI logic transistors and SOI memory transistors, and method for fabricating such a device. In one embodiment, integrated circuit device includes memory portion having, for example, PD or FD SOI memory cells, and logic portion having, for example, high performance transistors, such as Fin-FET, multiple gate transistors, and/or non-high performance transistors (such as single gate transistors that do not possess the performance characteristics of the high performance transistors).
申请公布号 US7335934(B2) 申请公布日期 2008.02.26
申请号 US20040884481 申请日期 2004.07.02
申请人 INNOVATIVE SILICON S.A. 发明人 FAZAN PIERRE
分类号 H01L27/108;H01L21/8239;H01L21/8242;H01L21/84;H01L27/105;H01L27/12;H01L29/786 主分类号 H01L27/108
代理机构 代理人
主权项
地址