发明名称 |
Method of manufacturing metal-oxide-semiconductor transistor |
摘要 |
A method of manufacturing a metal-oxide-semiconductor transistor is provided. A substrate having a gate structure thereon is provided. A source/drain extension region is formed in the substrate on each side of the gate structure. Thereafter, a carbon-containing material layer is formed over the substrate and then the carbon-containing material layer is etched back to form spacers on the sidewalls of the gate structure. Finally, a source/drain region is formed in the substrate on each side of the spacer-coated gate structure.
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申请公布号 |
US7335548(B2) |
申请公布日期 |
2008.02.26 |
申请号 |
US20060378004 |
申请日期 |
2006.03.17 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
WANG YUN-REN;YEN YING-WEI;LIU TONY E T |
分类号 |
H01L21/00;H01L21/336;H01L21/84;H01L29/78 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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