发明名称 Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
摘要 Methods, apparatuses, and systems for controlling mass flow rates and pressures in passageways coupled to reaction chambers are disclosed herein. In one embodiment, a method includes controlling a mass flow rate in a passageway in response to a first condition by modulating a valve of a mass flow and pressure control unit, and controlling a pressure in the passageway in response to a second condition different than the first condition by modulating the valve of the mass flow and pressure control unit. In another embodiment, an apparatus includes a mass flow measurement device, a pressure sensor, a modulating valve in the passageway, and a controller operably coupled to the mass flow measurement device, the pressure sensor, and the modulating valve. The controller has a computer-readable medium containing instructions to perform the above-mentioned method.
申请公布号 US7335396(B2) 申请公布日期 2008.02.26
申请号 US20030423711 申请日期 2003.04.24
申请人 MICRON TECHNOLOGY, INC. 发明人 CARPENTER CRAIG M.;DYNKA DANNY
分类号 C23C16/00;B05C11/00;C23C16/44;C23C16/455;C23C16/52;F17D1/02 主分类号 C23C16/00
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