发明名称 Semiconductor apparatus with improved yield
摘要 The semiconductor apparatus includes a pad; a first line layer placed immediately beneath the pad; and a lattice-shaped contact being between the pad and the first line layer.
申请公布号 US7335992(B2) 申请公布日期 2008.02.26
申请号 US20050090597 申请日期 2005.03.28
申请人 NEC ELECTRONICS CORPORATION 发明人 ANZAI KUNIO
分类号 H01L21/66;H01L23/48;H01L21/3205;H01L21/82;H01L21/822;H01L23/485;H01L23/52;H01L23/528;H01L27/04;H01L27/10;H01L29/40;H01L29/73 主分类号 H01L21/66
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