发明名称 Method of processing an object and method of controlling processing apparatus to prevent contamination of the object
摘要 A method of manufacture includes processing an object in a chamber and subsequently generating an electrical force of attraction to float contaminants off of a region adjacent the processed object before the object is unloaded from the chamber. The object may be processed with the use of plasma. The plasma is produced by introducing a first gas into the chamber and applying a source power to the first gas. The plasma is extinguished after the object is processed with the use of the plasma. Then, a second gas is introduced into the chamber and a source power is applied to the second gas to generate the electrical force of attraction. At this time, the parameters are controlled so that particle contaminants are readily removed without any influence on the object. Also, the same electrode can be used to apply source power to both the first and second gas. Thus, the operation of removing the particle contaminants is relatively simple.
申请公布号 US7335601(B2) 申请公布日期 2008.02.26
申请号 US20050255995 申请日期 2005.10.24
申请人 发明人
分类号 H01L21/302 主分类号 H01L21/302
代理机构 代理人
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