发明名称 Use of palladium in IC manufacturing with conductive polymer bump
摘要 An apparatus and a method for forming a substrate having a palladium metal layer over at least one contact point of the substrate and having a flexible conductive polymer bump, preferably a two-stage epoxy, on the palladium plated contact point, are provided. The present invention also relates to assemblies comprising one or more of these substrates.
申请公布号 US7335988(B2) 申请公布日期 2008.02.26
申请号 US20050145632 申请日期 2005.06.06
申请人 MICRON TECHNOLOGY, INC. 发明人 FARNWORTH WARREN M.;AKRAM SALMAN
分类号 H01L23/52;H01L21/288;H01L21/48;H01L21/56;H01L21/60;H01L23/485;H01L23/498;H05K3/24;H05K3/32 主分类号 H01L23/52
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