发明名称 |
METHOD AND INSTALLATION FOR REFINING SILICON |
摘要 |
The invention concerns a method for refining silicon, consisting in filling a cold induction crucible (1) with solid silicon; liquefying the crucible content; carrying out, using the induction crucible, a turbulent mixing of the silicon bath (b) by bringing up the liquid from the bottom of the crucible towards the free surface along the crucible central axis; directing a plasma (f) generated by an induction plasma torch (2) towards the bath surface for a time interval enabling the elimination of impurities for which the plasma reactive gas (g r) is adapted.
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申请公布号 |
CA2315019(C) |
申请公布日期 |
2008.02.26 |
申请号 |
CA19982315019 |
申请日期 |
1998.12.17 |
申请人 |
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) |
发明人 |
GARNIER, MARCEL;TRASSY, CHRISTIAN |
分类号 |
C01B33/037;H01L31/04 |
主分类号 |
C01B33/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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