| 摘要 |
A chromium oxide powder for a sputtering target, characterized in that it comprises chromium oxide having a sulfur content of 100 ppm by weight or less. A sputtering target which has a sulfur content of 100 ppm by weight and comprises 5 mol % or more of chromium oxide having a purity excluding gaseous components including moisture, carbon, nitrogen and sulfur of 99.95 wt % or higher. Provided are a chromium oxide powder for a sputtering target which has an increased purity and, when produced into a spattering target, shows an increased density of a sintered body; and a sputtering target which is produced by using the chromium oxide powder and which has fine crystal grains, is free from the occurrence of cracking and is uniform and minute. |
