Method of forming a contact in a semiconductor device,申请号KR20010088001-传众专利搜索

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发明名称	Method of forming a contact in a semiconductor device
摘要
申请公布号	KR100807082(B1)	申请公布日期	2008.02.25
申请号	KR20010088001	申请日期	2001.12.29
申请人		发明人
分类号	H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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