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发明名称
Method for fabricating semiconductor device with metal gate electrode
摘要
申请公布号
KR100806135(B1)
申请公布日期
2008.02.22
申请号
KR20020030304
申请日期
2002.05.30
申请人
发明人
分类号
H01L21/336
主分类号
H01L21/336
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代理人
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