SURFACE TREATING AGENT FOR PATTERN FORMATION

摘要

Disclosed is a surface treating agent for photolithography containing at least one of a fluorine monomer (A) described below and a fluorine polymer (B) containing the fluorine monomer. The fluorine monomer (A) is at least one fluorine monomer selected from (A-1) an a-substituted acrylate containing a fluoroalkyl group having 1-6 carbon atoms; (A-2) a fluorine-containing silsesquioxane monomer containing a fluoroalkyl group having 1-6 carbon atoms and a polymerizable group; (A-3) a polymerizable monomer containing a perfluoropolyether group; (A-4) a monomer wherein a fluoroalkyl group having 1-6 carbon atoms and a polymerizable group are linked by-SO2(CH2)n-(wherein n is 1-10) ; and (A-5) a macromonomer containing at least one of the monomers (A-1)-(A-4) as a repeating unit and having a (meth)acryloyl group at a polymer end. This surface treating agent provides a liquid repellent region with sufficiently high water repellency and oil repellency even thought it has a short-chain Rf group (short-chain fluoroalkyl group) having 6 or less carbon atoms.