| 摘要 |
<p>Provided is an exposure apparatus by which characteristic fluctuation of an optical system due to light irradiation heat can be accurately grasped. The exposure apparatus which exposes a subject (7) to be exposed to light projected from a light source (1a) is characterized in that detecting means (12, 13, 9) for detecting a light quantity of non-exposure wavelength component of the light are provided. Therefore, even when the light quantity of exposure wavelength component and the light quantity of the non-exposure wavelength component independently fluctuate, the characteristic fluctuation due to the irradiation heat of the optical system can be accurately grasped. As a result, a high performance mirror adjusting system can be also provided.</p> |
