发明名称 SUBSTRATE SUPPORT HAVING PROTECTION LAYER FOR PLASMA-RESISTANT PROPERTY
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate support assembly having a protection layer for increasing plasma resistant property. <P>SOLUTION: The substrate support assembly includes an electrostatic chuck having an upper substrate support face, and a protection layer disposed on the electrostatic chuck. The protection layer is formed of a ceramic material containing a rare earth metal. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008042197(A) 申请公布日期 2008.02.21
申请号 JP20070199390 申请日期 2007.07.31
申请人 APPLIED MATERIALS INC 发明人 SUN JENNIFER Y;CHOU IRENE A
分类号 H01L21/683;H02N13/00 主分类号 H01L21/683
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