FILM DEPOSITION APPARATUS, FILM DEPOSITION SYSTEM, AND FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a film deposition system having a small footprint and high productivity which is capable of avoiding cross contamination in each layer formed in a manufacturing process of an organic EL element or the like. SOLUTION: A film deposition apparatus 13 for performing the film deposition on a substrate G has a first film deposition mechanism 35 for depositing a first layer and a second film deposition mechanism 36 for depositing a second layer in a processing container 30. The first film deposition mechanism 35 comprises a nozzle 34 which is arranged inside the processing container 30 to feed a vapor of a film deposition material to the substrate, a vapor generation unit 45 which is arranged outside the processing container to generate the vapor of the film deposition material, and a pipe 46 for feeding the vapor of the film deposition material generated in the vapor generation unit 45 to the nozzle 34. COPYRIGHT: (C)2008,JPO&INPIT