| 摘要 |
The invention relates to a continuous processing system for processing continuous flexible substrates ( 17 S), comprising: two winding stations ( 10; 10 ') for unwinding and winding up the substrate; at least one processing station (B) situated, in the running path of the substrate, between both winding stations, and; lock valves ( 18 ), which are each located between a winding station ( 10; 10 ') and the at least one processing station and which serve to maintain different pressure levels in the winding stations and in the at least one processing station. The winding station is mounted on a base ( 11 ) and can be retracted, i.e. for changing the substrate. According to the invention, the winding stations ( 10; 10 ') and the processing station (B) are mounted in or on different bases that can move relative to one another. The base of the processing station is fixed and is provided as a part of a housing ( 1 ), which surrounds the processing station (B), and during operation, also surrounds the winding stations ( 10, 10 '), and this housing contains the valves ( 18 ). The winding stations ( 10; 10 ') are mounted in a frame ( 12 ), which surrounds their common base ( 11 ) and which has openings that can be closed off by the valves ( 18 ). During operation, this frame is accommodated inside the housing ( 1 ) of the processing station. The opened valves ( 18 ) can jointly evacuate the processing station (B) and the winding stations ( 10; 10 '), and when the valves ( 18 ) are closed, the winding stations can be ventilated independent of the processing station.
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