摘要 |
A first distributed Bragg reflector (3) (DBR) is deposited on a substrate (1). A layer (5) of cavity material is formed on the DBR reflector. Using a nano-imprint procedure, this is equipped with a number of filter elements (2a-2g) forming cavity sections (5a-5g). The second DBR reflector (4) is deposited on the cavity material, with structuring to define the differing heights of cavity sections (5a-5g). The substrate (1) includes a photoelectric detector. The surface of the substrate facing the filter elements is polished before deposition of the first DBR reflector. An independent claim is included for corresponding equipment. |