A PRECURSOR VAPOR PRESSURE MEASURING DEVICE FOR SEMICONDUCTOR MANUFACTURING PROCESS AND METHOD THEREOF

摘要

An apparatus and method of measuring vapor pressure of a precursor in a semiconductor manufacturing process is provided to measure the vapor pressure accurately by reducing pressure variation due to precursor deposition and degasification. A precursor sample is contained in a sample container(100), and a pressure detector(300) is connected to the sample container via a tube. A main pumping unit has a valve and a constant pressure maintaining chamber(200) in which the vaporized sample flows in the pressure detector. A sensor(110) is attached to the sample container to monitor a decomposing state of the sample during a measuring process. A purge gas and sensor controller(820) checks the decomposing state of the precursor based on the signal of the sensor. The sample container and the pressure detector are disposed in an adiabatic partition(600) in a sealing manner.