发明名称 CONCEALED IMAGE BY UNEVEN MICROSTRUCTURE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a concealed image by uneven microstructure in which the reproduced image of an original image can be viewed when enlarged by a magnifier or the like and a minute pattern can be recognized when enlarged by a microscope. <P>SOLUTION: In order to attain the target of the above-mentioned problem, the concealed image is constituted of the uneven microstructure incorporated in a pattern. The concealed image is constituted of the aggregates of fine patterns having predetermined depth or predetermined height. The fine pattern is displayed by a pattern with size corresponding to luminance of a minimized part of the original image. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008039889(A) 申请公布日期 2008.02.21
申请号 JP20060210769 申请日期 2006.08.02
申请人 DAINIPPON PRINTING CO LTD 发明人 SUZUKI SHINICHIRO
分类号 G02B5/18;B42D15/10;B44F1/10 主分类号 G02B5/18
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