| 摘要 |
PROBLEM TO BE SOLVED: To provide a CVD (chemical vapor deposition) equipment having a horizontal coating plane and power source-controlled hot filaments. SOLUTION: The CVD reactor mainly has a chamber, at least one or more rotating electrodes provided inside the chamber, hot filaments whose at least one end is connected to the surfaces of the rotating electrodes, and a rotating power source. In this invention, the rotating power source outputs rotating power to drive and rotate the rotating electrodes and to further stretch the hot filaments when the hot filaments expand due to a temperature change, thereby preventing the hot filaments from expanding and touching the substrate to damage the substrate. COPYRIGHT: (C)2008,JPO&INPIT
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