| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma film deposition apparatus where the cleaning of an anode can be easily performed with a simple constitution, and further, production efficiency is high. <P>SOLUTION: The plasma film deposition apparatus is equipped with: a vessel 101; a plasma gun 1 for generating plasma; an anode 48 for receiving plasma; a film deposition chamber 4 forming a part of the vessel 101 and having a film deposition space 42 at the inside thereof; a shielding member 52 provided between the anode 48 and the film deposition space 42, shielding and releasing the film deposition space 42 to the anode 48 by advancing to the position confronted with the anode 48 at the internal space of the vessel 101 and retreating therefrom, and also functioning as a discharge electrode; a driving mechanism 53 for driving the shielding member 52 so as to be advanced/retreated; and a power source 36 of applying voltage for generating plasma between the anode 48 and the shielding member 52 by discharging. <P>COPYRIGHT: (C)2008,JPO&INPIT |
