| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer which can exhibit a designed performance in an objective use, to provide a method for producing the same, and to provide a resist composition which can make a resist film to exhibit a designed performance and can inhibit defects in a resist pattern. <P>SOLUTION: A container not depositing a polymer of a former production lot on the contact of a poor solvent for the polymer of the production lot with the inside of the container is used as each container (polymerization tank 20, purification tank 30, dissolution tank 50 or concentration tank 70) used for the production of the polymer. <P>COPYRIGHT: (C)2008,JPO&INPIT |
