发明名称 ELECTROLESS PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for forming an electroless pure Ni plating film, which is excellent in solder joinability and solder wetting with a large amount of Ni without containing P, on the copper circuit part of a printed wiring board or a copper member such as the joining part of an electronic component, etc. SOLUTION: A pure Ni plating layer 10 without containing P in an electroless Ni plating film is formed on a Cu electrode 3, etc., in order to join by soldering the electronic component onto the printed wiring board composed of a glass epoxy resin base material 5. Thus, the electroless plating method excellent in solder joinability and solder wettability is provided. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008042071(A) 申请公布日期 2008.02.21
申请号 JP20060216867 申请日期 2006.08.09
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ITO KIYOSHI
分类号 H05K3/24;B23K1/00;B23K1/19;B23K1/20;B23K101/42;C23C18/34;C23C18/52;H05K3/34 主分类号 H05K3/24
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