发明名称 Nitride Compound Semiconductor Element and Production Method Therefor
摘要 A nitride compound semiconductor element according to the present invention is a nitride compound semiconductor element including a substrate 1 having an upper face and a lower face and a semiconductor multilayer structure 40 supported by the upper face of the substrate 1 , such that the substrate 1 and the semiconductor multilayer structure 40 have at least two cleavage planes. At least one cleavage inducing member 3 which is in contact with either one of the two cleavage planes is provided, and a size of the cleavage inducing member 3 along a direction parallel to the cleavage plane is smaller than a size of the upper face of the substrate 1 along the direction parallel to the cleavage plane.
申请公布号 US2008042244(A1) 申请公布日期 2008.02.21
申请号 US20050568481 申请日期 2005.10.13
申请人 ANZUE NAOMI;YOKOGAWA TOSHIYA;HASEGAWA YOSHIAKI 发明人 ANZUE NAOMI;YOKOGAWA TOSHIYA;HASEGAWA YOSHIAKI
分类号 H01L29/12;H01L21/00 主分类号 H01L29/12
代理机构 代理人
主权项
地址