发明名称 |
Photoresist composition and method of manufacturing a color filter substrate by using the same |
摘要 |
A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the color filter may be improved.
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申请公布号 |
US2008044766(A1) |
申请公布日期 |
2008.02.21 |
申请号 |
US20070821411 |
申请日期 |
2007.06.22 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KWON SE-AH;HUH CHUL;KIM JIN-SEUK;KIM BYOUNG-JOO |
分类号 |
G03C1/73;G02B5/20;G02B5/22;G03F7/004;G03F7/032 |
主分类号 |
G03C1/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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