METHOD FOR PRODUCING ORIGINAL PLATE, METHOD FOR PRODUCING MICRONEEDLE PATCH, MICRONEEDLE PATCH, AND EXPOSURE APPARATUS

摘要

Disclosed is a method for producing an original plate, which comprises a step for forming a photoresist film on a substrate, a step for arranging a photomask having a plurality of light-shielding island portions on the photoresist film and integrating them together, a step for selectively exposing the photoresist film by irradiating it with light from a light source through the photomask, and a step for forming an original plate by developing the photoresist film. This method for producing an original plate is characterized by comprising a process wherein the photoresist film is selectively exposed by being irradiated with lights from a plurality of directions respectively through the photomask.