| 摘要 |
The invention relates to an apparatus for coating a substrate using physical vapour deposition, comprising a vacuum chamber wherein a coil (1) is placed for keeping an amount of conductive material (10) in levitation and for heating and evaporating that material, using a varying electric current in the coil, and wherein means (3) are placed in the coil to isolate the coil from the levitated material. According to the invention, the apparatus is characterised in that the isolating means are part of a container (2) made of non-conductive material, the container having one or more openings (5) for guiding evaporated conductive material to the substrate to be coated. The invention relates to a method for coating a substrate using physical vapour deposition. |
