| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device and a method, wherein a micro-wave can be propagated efficiently in a treatment chamber from a plurality of slots installed at the lower face of a wave guide tube. <P>SOLUTION: When the micro-wave is propagated into dielectrics 32 arranged at the upper face of the treatment chamber 4 through a plurality of slots 70 formed at the lower face of a rectangular wave guide tube 35, a treatment gas supplied into the treatment chamber 4 is turned into plasma by an electric field energy in an electromagnetic field formed on the surface of the dielectrics 32, and a substrate G is plasma treated, a VSWR (Voltage Standing Wave Ratio) of the micro-wave propagated in the rectangular wave guide tube is measured, then based on the measured VSWR, the wavelength of the micro-wave propagated in the rectangular wave guide tube 35 is changed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
